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专利名称：Optical waveguides and grating structures
fabricated using polymeric dielectriccompositions
发明人：Jeffrey M. Catchmark,Guy P. Lavallee申请号：US10206144申请日：20020726
公开号：US20030039443A1公开日：20030227
专利附图：
摘要：Using polymeric dielectric materials (preferably materials derived frombisbenzocyclobutene monomers) and an electron beam lithography process for
patterning this material, we have developed a process for fabricating optical waveguideswith complex integrated devices such as gratings. Such gratings are not limited to one-dimensional type gratings but can include 2 dimensional gratings such as curved gratingsor photonic crystals. Due to the properties of BCB, this process could also be
implemented using optical photolithography depending upon the waveguide dimensionsdesired and the grating dimensions desired. Alternatively, the optical waveguide could bepatterned using optical lithography and the grating can be patterned using electronbeam lithography. Gratings with much more dimensional precision can be fabricated usingelectron beam lithography. Gratings fabricated with precise dimensional control arerequired, for example, for many applications including Dense Wavelength DivisionMultiplexing (DWDM) for telecommunications applications. In addition, the generalprocess described below can be applied to the fabrication of complex lightwave circuitscontaining, for example, multiple optical waveguides, couplers/splitters, grating basedfilters and even more complex devices and structures. Many other variations on thesedevices and structures as well as other structures can be developed using this process aswould be apparent to anyone skilled in the art.
申请人：THE PENN STATE RESEARCH FOUNDATION
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