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专利名称：Processing apparatus
发明人：Tezuka, Kazuyuki,Kato, Kenichi,Sawachi,
Atsushi,Kikuchi, Takamichi,Mimura, Takanori
申请号：EP11009280.6申请日：20111123公开号：EP2458618A2公开日：20120530
专利附图：
摘要：There is provided a processing apparatus including a processing gas dischargeunit 5 provided within a processing chamber 2 so as to face a mounting table 4 andconfigured to discharge a processing gas into the processing chamber 2; a first space 15a
corresponding to a central portion in a surface of a processing target object; a secondspace 15i corresponding to an edge portion in the surface of the processing targetobject; at least one third space 15b to 15h formed between the first space 15a and thesecond space 15i; and a processing gas distribution unit 12 including processing gasdistribution pipes 18a to 18i and valves 19a to 19h. The spaces 15a to 15i are providedwithin the processing gas discharge unit 5 and partitioned by partition walls 14. At thespaces 15a to 15i, there are formed discharge holes 16 for discharging the processinggas. The processing gas distribution pipes 18a to 18i communicate with the spaces, andthe valves 19a to 19h are opened or closed to allow adjacent processing gas distributionpipes 18a to 18i to communicate with each other or be isolated from each other.
申请人：Tokyo Electron Limited
地址：3-1 Akasaka 5-chome Minato-ku Tokyo 107-6325 JP
国籍：JP
代理机构：Manitz, Finsterwald & Partner GbR
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