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专利名称：DEVICE AND METHOD FOR THE OPTICAL
MEASUREMENT OF AN OPTICAL SYSTEM BYUSING AN IMMERSION FLUID
发明人：Ulrich Wegmann,Uwe Schellhorn,Joachim
Stuehler,Albrecht Ehrmann,Martin
Schriever,Markus Goeppert,Helmut Haidner
申请号：US12147034申请日：20080626
公开号：US20090021726A1公开日：20090122
专利附图：
摘要：A device for the optical measurement of an optical system, in particular anoptical imaging system, is provided. The device includes at least one test opticscomponent arranged on an object side or an image side of the optical system. Animmersion fluid is adjacent to at least one of the test optics components. A container foruse in this device, a microlithography projection exposure machine equipped with thisdevice, and a method which can be carried out with the aid of this device are alsoprovided. The device and method provide for optical measurement of microlithographyprojection objectives with high numerical apertures by using wavefront detection withshearing or point diffraction interferometry, or a Moiré measuring technique.
申请人：Ulrich Wegmann,Uwe Schellhorn,Joachim Stuehler,Albrecht Ehrmann,MartinSchriever,Markus Goeppert,Helmut Haidner
地址：Koenigsbronn DE,Aalen DE,Aalen DE,Koenigsbronn DE,Aalen DE,Aalen DE,AalenDE
国籍：DE,DE,DE,DE,DE,DE,DE
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