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专利名称：Method of planarizing microstructures发明人：Peter B. Mumola申请号：US08/153681申请日：19931117公开号：US05419803A公开日：19950530
摘要：A method of planarizing a microstructure (16) includes the steps of providing alayer (18) of material over the microstructure (16) such that an overcoating surface (20) isformed, measuring the thickness of the layer (18) across the surface (20) forming a dwelltime versus position map and removing material from the layer (18) of material by use ofa plasma assisted chemical etching tool in accordance with the dwell time versus positionmap.
申请人：HUGHES AIRCRAFT COMPANY
代理人：W. C. Schubert,W. K. Denson-Low
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