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专利名称：Method for Electrostatically Attracting and
Processing a Glass Insulative Substrate
发明人：KITABAYASHI, Tetsuo,HORI,
Hiroaki,UCHIMURA, Takeshi,TATENO,Noriaki,FUWA, Koh,MAEHIRA, Ken
申请号：EP00929866.2申请日：20000525公开号：EP1191581B1公开日：20080123
摘要：According to the present invention, there is provided an electrostatic chuck forelectrostatically attracting an insulative substrate, an apparatus for heating/cooling aninsulative substrate using the electrostatic chuck, and a method for controlling thetemperature of an insulative substrate. The shape and the properties of the dielectric,and the shape of the electrodes, which form the electrostatic chuck, are disclosed. Alsothe apparatus for heating/cooling an insulative substrate comprising a plate, a gas supplyconduit and a temperature controlling system, and the apparatus for processing aninsulative substrate in which the apparatus for heating/cooling an insulative substrate isinstalled are disclosed.
申请人：TOTO LTD,ULVAC INC
地址：JP,JP
国籍：JP,JP
代理机构：Hall, Matthew Benjamin
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