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专利名称：Methods of forming a photosensitive film发明人：Ahn-Ho Lee,Baik-Soon Choi,Seung-Hyun
Ahn,Sang-Tae Kim,Yong-Il Kim,Shi-JinSung,Kyong-Ho Lee
申请号：US12539041申请日：20090811公开号：US08227182B2公开日：20120724
专利附图：
摘要：In a thinner composition and a method of forming a photosensitive film, thethinner composition includes about 50 to about 90% by weight of propylene glycol
monomethyl ether acetate, about 1 to about 20% by weight of propylene glycolmonomethyl ether, about 1 to about 10% by weight of γ-butyrolactone, and about 1 toabout 20% by weight of n-butyl acetate. The thinner composition may have a propervolatility and an improved ability to dissolve various types of photosensitive materials,and thus the thinner composition may be usefully employed in an edge bead rinseprocess, a rework process or a pre-wetting process.
申请人：Ahn-Ho Lee,Baik-Soon Choi,Seung-Hyun Ahn,Sang-Tae Kim,Yong-Il Kim,Shi-JinSung,Kyong-Ho Lee
地址：Gyeonggi-do KR,Gyeonggi-do KR,Gyeonggi-do KR,Jeonbuk KR,Seoul KR,SeoulKR,Daejeon KR
国籍：KR,KR,KR,KR,KR,KR,KR
代理机构：Myers Bigel Sibley & Sajovec, PA
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