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专利名称：Amorphous Silicon Oxide, Amorphous Silicon
Oxynitride, and Amorphous Silicon NitrideThin Films and Uses Thereof
发明人：Venu Varanasi,Pranesh Aswath,Megen
Maginot,Nickolay V. Lavrick
申请号：US14848107申请日：20150908
公开号：US20160067387A1公开日：20160310
摘要：Amorphous SiOx (SiO2), SiONx, silicon nitride (Si3N4), surface treatments areprovided, on both metal (titanium) and non-metal surfaces. Amorphous silicon-filmsurface treatments are shown to enhance osteoblast and osteoblast progenitor cellbioactivity, including biomineral formation and osteogenic gene panel expression, as wellas enhanced surface hydroxyapatite (HA) formation. A mineralized tissue interface isprovided using the amorphous silicon-based surface treatments in the presence ofosteoblasts, and provides improved bone cell generation/repair and improved interfacefor secure attachment/bonding to bone. Methods for providing PEVCD-based siliconoverlays onto surfaces are provided. Methods of increasing antioxidant enzyme (e.g.,superoxide dismutase) expression at a treated surface for enhanced healing are alsoprovided. Continuous generation and release of Si4+ ion into an in vitro or in vivoenvironment in the presence of osteoblasts/osteoblast progenitor cells, methods ofemploying same for enhancing the rate of bone healing/bone regeneration, is alsodescribed.
申请人：Venu Varanasi,Pranesh Aswath,Megen Maginot,Nickolay V. Lavrick
地址：Lewisville TX US,Grapevine TX US,Beeville TX US,Knoxville TN US
国籍：US,US,US,US
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