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专利名称：Method for generating hydrogen and
hydrogen generation device used therefor
发明人：Satoru Tamura,Kazuhito Hato,Takaiki
Nomura,Takahiro Kurabuchi,YoshihiroKozawa,Ryousuke Kikuchi
申请号：US14810201申请日：20150727公开号：US10047444B2公开日：20180814
专利附图：
摘要：Provided is a method for generating hydrogen. The method comprising (a)
preparing a hydrogen generation device comprising a container, a photo-semiconductorelectrode comprising a substrate, a light-blocking first conductive layer, and a firstsemiconductor photocatalyst layer, a counter electrode, a conductive wire for electricallyconnecting the first conductive layer to the counter electrode, and a liquid stored in thecontainer, and (b) irradiating the first semiconductor photocatalyst layer with light togenerate hydrogen on the counter electrode. The first conductive layer is interposedbetween the substrate and the first semiconductor photocatalyst layer. At least a part ofthe first semiconductor photocatalyst layer is in contact with the liquid. At least a part ofthe counter electrode is in contact with the liquid. The liquid is selected from the groupconsisting of an electrolyte aqueous solution and water. The substrate is formed of aresin.
申请人：Panasonic Intellectual Property Management Co., Ltd.
地址：Osaka JP
国籍：JP
代理机构：McDermott Will & Emery LLP
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