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专利名称：ORGANIC SEMICONDUCTOR INK
COMPOSITION AND METHOD FORFORMING ORGANIC SEMICONDUCTORPATTERN USING THE SAME
发明人：Masayoshi Koutake,Masanori Kasai,Hisatomo
Yonehara,Kiyofumi Takano
申请号：US13262310申请日：20100330
公开号：US20120100667A1公开日：20120426
专利附图：
摘要：Provided is an ink that is the most suitable for a method for forming an organictransistor by transferring a pattern using a liquid-repellent transfer substrate, forexample, a microcontact printing method or a reverse printing method. Specifically,provided is an organic semiconductor ink composition which can provide a uniform inkcoating film on a surface of a liquid-repellent transfer substrate and which can provide adry ink film or a semi-dry ink film capable of being easily transferred from the transfer
substrate to a transfer-receiving base material. Also provided is a method for forming anorganic semiconductor pattern of an organic transistor, the method using the organicsemiconductor ink composition. The organic semiconductor ink composition used forobtaining a desired pattern by transferring an ink layer formed on a liquid-repellenttransfer substrate to a printing base material contains an organic semiconductor, anorganic solvent, and a fluorine-based surfactant.
申请人：Masayoshi Koutake,Masanori Kasai,Hisatomo Yonehara,Kiyofumi Takano
地址：Tokyo JP,Tokyo JP,Tokyo JP,Chiba JP
国籍：JP,JP,JP,JP
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