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专利名称：Method for fabrication of multi-step
structures using embedded etch stop layers
发明人：Donald L. Smith,James C. Mikkelsen,
Jr.,Babur B. Hadimioglu,Martin G. Lim
申请号：US09211781申请日：19981215公开号：US06187211B1公开日：20010213
专利附图：
摘要：A method of fabrication is provided for multi-step microlithographic structuresincluding Fresnel lenses whereby the process includes the formation of intermediate etch
stop layers that are embedded with the structure material. This is accomplished in oneaspect of the invention by depositing Fresnel lens material using known techniques andthe selectively altering the chemistry of the material being deposited to form theintermediate etch stop layers at suitable positions without interrupting the depositionprocess. In another aspect, etch stop layers are patterned on layers of the lens materialand embedded between such layers. The structure, or lens, is then formed using masking,patterning and etching techniques.
申请人：XEROX CORPORATION
代理机构：Fay, Sharpe, Fagan, Minnich & McKee, LLP
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