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专利名称：Method of selectively monitoring trace
constituents in plating baths
发明人：Bruce M. Eliash申请号：US07/976118申请日：19921113公开号：US05298129A公开日：19940329
摘要：A method of selectively monitoring particular trace constituents within a platingbath containing multiple trace constituents. The method provides improved selectivityover known voltammetric techniques for certain plating baths and trace constituents. Themethod involves applying a brief voltammetric plating signal to a pretreated electrodepositioned within the plating bath solution, applying a rapid stripping signal to the platedelectrode, and monitoring the resultant stripping signal response current. Thecharacteristics of the stripping signal response current indicate the particular traceconstituent concentration level. The method complements and is easily integrated withknown voltammetric techniques and equipment, and thus improves the efficiency andversatility of existing plating bath analysis systems.
申请人：HUGHES AIRCRAFT COMPANY
代理人：M. E. Lachman,M. W. Sales,W. K. Denson-Low
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