专利内容由知识产权出版社提供
专利名称：ANTIPATHOGENIC BIOMEDICAL IMPLANTS,
METHODS AND KITS EMPLOYING
PHOTOCATALYTICALLY ACTIVE MATERIAL
发明人：Stromme, Maria,Welch, Ken,Engqvist, Håkan申请号：EP09713082.7申请日：20090220公开号：EP2254609A2公开日：20101201
摘要：An antipathogenic biomedical implant is formed throughout its structure of amatrix material comprising at least about 1 weight percent of a photocatalytically activefiller which exhibits an antipathogenic effect upon irradiation with light. The
photocatalytically active filler is arranged in the matrix material in the implant to receivelight irradiated from an external light source. In another embodiment, an antipathogenicbiomedical implant comprises at least about 1 weight percent of a photocatalyticallyactive material which exhibits an antipathogenic effect upon irradiation with light, whereinthe photocatalytically active material is arranged in the implant to receive light irradiatedfrom an external light source. Methods for providing an antipathogenic biomedicalimplant, methods for reducing pathogens on a biomedical implant, methods for reducingthe bioburden in a biomedical implant installation, and kits for providing an
antipathogenic biomedical implant employ the antipathogenic biomedical implants.
申请人：Stromme, Maria,Welch, Ken,Engqvist, Håkan
地址：Gardesvagen 25B 756 51 Upssala SE,Pilsbovägen 21B 19334 SigtunaSE,Källörsgätan 6 74236 Östhammar SE
国籍：SE,SE,SE
代理机构：Dzieglewska, Hanna Eva
更多信息请下载全文后查看
