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专利名称：MICROELECTROMECHANICAL SYSTEM发明人：Li-Ken YEH,I-Hsiang CHIU申请号：US12652736申请日：20100105
公开号：US20100109121A1公开日：20100506
专利附图：
摘要：A micro electromechanical system and a fabrication method thereof, which hastrenches formed on a substrate to prevent circuits from interfering each other, and toprevent over-etching of the substrate when releasing a microstructure.
申请人：Li-Ken YEH,I-Hsiang CHIU
地址：Hsinchu TW,Hsinchu TW
国籍：TW,TW
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