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专利名称：EXPOSURE APPARATUS, EXPOSURE
METHOD, AND METHOD FOR PRODUCINGDEVICE
发明人：Nagasaka, Hiroyuki,Onda, Minoru申请号：EP161837.3申请日：20050608公开号：EP3067749B1公开日：20171018
摘要：An exposure apparatus EX has a projection optical system PL. The projectionoptical system PL has a first optical element LS1 closest to an image plane thereof and asecond optical element LS2 which is second closest to the image plane with respect tothe first optical element LS1. The first optical element LS1 has a lower surface T1arranged opposite to a surface of a substrate P and an upper surface T2 arrangedopposite to the second optical element LS2. A space between the second opticalelement LS2 and the upper surface T2 of the first optical element LS1 is filled with asecond liquid LQ2 so that a liquid immersion area is formed in an area of the uppersurface T2, the area including an area AR' through which an exposure light beam ELpasses. The substrate P is exposed by radiating the exposure light beam EL onto thesubstrate P through a first liquid LQ1 on a side of the lower surface T1 of the first opticalelement LS1 and the second liquid LQ2 on a side of the upper surface T2. It is possible toavoid any deterioration of the exposure accuracy caused by the pollution of the opticalelement, and to suppress any enormous expansion of the liquid immersion area.
申请人：NIKON CORP
地址：JP
国籍：JP
代理机构：Hoffmann Eitle
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